Onto Innovation Inc. (NYSE: ONTO) has launched the Atlas G6 optical critical dimension (OCD) metrology system, aiming to equip semiconductor manufacturers with the process control needed for the next wave of AI-driven devices.
As chipmakers move toward second-generation gate-all-around (GAA) logic and vertical gate DRAM architectures, structural dimensions are shrinking by as much as 30% per generation. These tighter geometries demand greater precision in measuring nanowires in GAA transistors and smaller DRAM cell blocks used in high bandwidth memory (HBM). Onto says the Atlas G6 delivers the accuracy and small spot size required to support these complex requirements, enabling better yield and reliability for advanced logic and memory devices.
The company has already secured multiple production orders from leading logic and memory manufacturers, highlighting the growing demand for high-performance metrology systems in AI-centric semiconductor fabrication.
For logic devices, precise control of each nanowire in GAA transistors is essential to achieve the faster switching speeds and lower power consumption that next-generation AI processors require. The Atlas G6 integrates enhanced real-time stabilization technologies that improve measurement precision, helping manufacturers meet aggressive performance targets.
In memory production, HBM designs rely on smaller DRAM cell block sizes to deliver higher bandwidth, improved latency, and lower energy use. The Atlas G6’s smaller spot size enables direct on-device measurements within DRAM cell blocks, tightening process windows and boosting long-term device reliability.
Beyond hardware improvements, the system introduces an additional data channel that works in tandem with Onto’s Ai Diffract™ OCD analysis software and machine learning models. This integration enhances recipe robustness and reduces time to solution, addressing one of the key bottlenecks in semiconductor process development.
“As the latest evolution of our industry-leading Atlas family, the Atlas G6 system provides control of device features that were previously difficult to measure,” said Ido Dolev, executive vice president of product solutions at Onto Innovation. “Advancements in AI technologies depend on innovations in process control, and the Atlas G6 metrology system sets a new benchmark for optical metrology performance.”
